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High throughput, high quality dry etching of copper/barrier film stacks
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2000
Journal Article
Title
High throughput, high quality dry etching of copper/barrier film stacks
Author(s)
Markert, M.
Bertz, A.
Gessner, T.
Ye, Y.
Zhao, A.
Ma, D.
Journal
Microelectronic engineering
DOI
10.1016/S0167-9317(99)00310-X
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM