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  4. Accessing the Nonlinear Regime with Selectively Laser Etched High-Q Microresonators
 
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2024
Conference Paper
Title

Accessing the Nonlinear Regime with Selectively Laser Etched High-Q Microresonators

Abstract
Fused silica microresonators fabricated with the selective laser etching and annealing process with high-Q factors is presented. Due to the high-Q factors, frequency comb generation, stimulated Raman scattering, and opto-mechanical instability are experimentally observed.
Author(s)
Bi, Toby
Max Planck Institute for the Science of Light
Beckmann, Lara
Fraunhofer-Institut für Lasertechnik ILT  
Thoms, Julian M.
Max Planck Institute for the Science of Light
Wenk, Max
Fraunhofer-Institut für Lasertechnik ILT  
Zhang, Shuangyou
Max Planck Institute for the Science of Light
Kratz, Martin
Fraunhofer-Institut für Lasertechnik ILT  
Del’Haye, Pascal
Max Planck Institute for the Science of Light
Mainwork
16th Pacific Rim Conference on Lasers and Electro Optics CLEO PR 2024
Conference
16th Pacific Rim Conference on Lasers and Electro-Optics, CLEO-PR 2024
DOI
10.1109/CLEO-PR60912.2024.10676883
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
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