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2018
Journal Article
Title

Rhodium doped InGaAs

Title Supplement
A superior ultrafast photoconductor
Abstract
The properties of rhodium (Rh) as a deep-level dopant in InGaAs lattice matched to InP grown by molecular beam epitaxy are investigated. When InGaAs:Rh is used as an ultrafast photoconductor, carrier lifetimes as short as 100 fs for optically excited electrons are measured. Rh doping compensates free carriers so that a near intrinsic carrier concentration can be achieved. At the same time, InGaAs:Rh exhibits a large electron mobility of 1000 cm2/V s. Therefore, this material is a very promising candidate for application as a semi-insulating layer, THz antenna, or semiconductor saturable absorber mirror.
Author(s)
Kohlhaas, R.B.
Globisch, B.
Nellen, S.
Liebermeister, L.
Schell, M.
Richter, P.
Koch, M.
Semtsiv, M.P.
Masselink, W.T.
Journal
Applied Physics Letters  
DOI
10.1063/1.5016282
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
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