2018
Conference Paper
Title

Application of quantum cascade laser absorption spectroscopy for correlation studies in plasma etching processes in the semiconductor industry

Abstract
Applying quantum cascade laser absorption spectroscopy a correlation could be demonstrated between the concentration of the etching products SiF4 and CO and the etching rate of ultra-low-k SiCOH in a low-pressure rf plasma containing CF4.
Author(s)
Lang, N.
Zimmermann, Sven
Zimmermann, H.
Macherius, U.
Uhlig, B.
Schaller, M.
Schulz, Stefan E.  
Röpcke, J.
Helden, J.H. van
Mainwork
Conference
DOI
Language
English