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2009
Conference Paper
Title

3D integration technologies for MEMS/IC systems

Abstract
3D integration is a key solution to the predicted performance problems of future ICs as well as it offers extreme miniaturization and cost-effective fabrication of so-called More than Moore products as e.g. MEMS/IC systems. Through Silicon Via (TSV) technologies enable high interconnect performance at relatively high fabrication cost compared to 3D packaging. In general it is not only one 3D integration technology suitable for the fabrication of the large variety of 3D integrated systems. Moreover, even one single product may need several different technologies for a cost-effective fabrication. Wireless sensor systems (e.g. e-CUBES (R)) an excellent example for the need of a suitable mixture. Consisting of MEMS, ICs, memories, antennas and power modules they can only be fabricated in a cost-efficient way by application of specific optimized 3D technologies for the integration of the different sub-modules. The technology choice for an e-CUBES demonstrator is described.
Author(s)
Ramm, P.
Klumpp, A.
Weber, J.
Mainwork
IEEE Bipolar/BiCMOS Circuits and Technology Meeting, BCTM 2009  
Conference
Bipolar/BiCMOS Circuits and Technology Meeting (BCTM) 2009  
DOI
10.1109/BIPOL.2009.5314117
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
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