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  4. Simulation of dry silicon etching in the absence of ion bombardment
 
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1999
Conference Paper
Title

Simulation of dry silicon etching in the absence of ion bombardment

Title Supplement
An example for cooperation between process development and equipment design
Author(s)
Otto, T.
Hofmann, M.
Wolf, H.
Streiter, R.
Schubert, A.
Gessner, T.
Mainwork
Precision Engineering - Nanotechnology. Proceedings of the 1st International EUSPEN Conference. Vol.2  
Conference
European Society for Precision Engineering and Nanotechnology (International Conference and General Meeting) 1999  
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
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