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Simulation of dry silicon etching in the absence of ion bombardment
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1999
Conference Paper
Title
Simulation of dry silicon etching in the absence of ion bombardment
Title Supplement
An example for cooperation between process development and equipment design
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Author(s)
Otto, T.
Hofmann, M.
Wolf, H.
Streiter, R.
Schubert, A.
Gessner, T.
Mainwork
Precision Engineering - Nanotechnology. Proceedings of the 1st International EUSPEN Conference. Vol.2
Conference
European Society for Precision Engineering and Nanotechnology (International Conference and General Meeting) 1999
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM