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  4. Smart power integration on SOI: thin and thick film (local) SOI processes and devices
 
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2000
Conference Paper
Title

Smart power integration on SOI: thin and thick film (local) SOI processes and devices

Abstract
Increasing requirements for power systems with regard to functionality, performance and reliability demand the integration of power devices and control circuitry together in one chip. One promising technique to integrate quasivertical or vertical power devices and intelligent drive and control circuits is by employing Silicon-on-Insulator (SOI) material. In this paper we discuss several methods to produce (local) SOI wafers as a prerequisite for advanced smart power processes. We then present two versatile process schemes based on thin and thick film SOI and briefly describe application examples.
Author(s)
Paschen, U.
Weyers, J.
Bentum, R. van
Steck, B.
Vogt, F.P.
Vogt, H.
Mainwork
CIPS 2000. International Conference on Integrated Power Systems  
Conference
International Conference on Integrated Power Systems 2000  
Language
English
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Keyword(s)
  • local SIMOX

  • trench isolation

  • SIMOX-Technologie

  • Smart-power-Technik

  • SOI-Technologie

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