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  4. Self-aligned, fluxless flip-chip bonding technology for photonic devices
 
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1996
Conference Paper
Title

Self-aligned, fluxless flip-chip bonding technology for photonic devices

Abstract
The self-aligned flip-chip (FC) bonding technique is a very attractive means for the assembly of photonic devices containing multiple optical as well as electrical waveguide interconnects. In this article we propose a fluxless FC-bonding technology which nevertheless ensures efficient solder oxide reduction by applying molecular hydrogen (H2) under vacuum conditions. Bonding experiments were carried out in a newly developed FC-bonder of which some interesting details are reported. Reproducable bonding accuracies below the required tolerances for fiber to tapered waveguide coupling of <or=3 mu m have been achieved. Using eutectic tin-lead (SnPb 60/40) solder and platinum (Pt) as a wettable pad metallization these bonding results have been obtained at moderate temperatures (250 degrees C) and heating durations (2 min). An investigation on the oxidation kinetics of molten SnPb 60/40 solder confirms the ability of H2 to reduce solder oxides when thermodynamic boundary conditions are met. The leach resistance of the Pt thin-film metallization (300 nm) has been prooved by SIMS depth profiles for the required bonding temperatures and durations.
Author(s)
Kuhmann, J.F.
Hensel, H.-J.
Pech, D.
Harde, P.
Bach, H.-G.
Mainwork
46th Electronic Components and Technology Conference 1996. Proceedings  
Conference
Electronic Components and Technology Conference (ECTC) 1996  
DOI
10.1109/ECTC.1996.550817
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • flip-chip devices

  • metallisation

  • optical fabrication

  • optical waveguides

  • oxidation

  • soldering

  • self-aligned fluxless flip-chip bonding technology

  • photonic device

  • optical waveguide interconnect

  • electrical waveguide interconnect

  • assembly

  • fiber to tapered waveguide coupling

  • eutectic tin-lead solder

  • oxidation kinetics

  • thermodynamic boundary conditions

  • leach resistance

  • platinum thin-film metallization

  • sims depth profile

  • 250 c

  • snpb

  • pt

  • h2

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