• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Plasma hydrogen passivation for crystalline silicon thin-films
 
  • Details
  • Full
Options
2008
Conference Paper
Title

Plasma hydrogen passivation for crystalline silicon thin-films

Abstract
This paper presents the beneficial effects of Remote Plasma Hydrogen passivation (RPHP) on Recrystallized Wafer-Equivalent (RexWE) solar cells. We varied the dominating parameters of the RPHP process and analysed their effect on the RexWE solar cell parameters. A low and a high temperature regime were investigated for the RPHP. Both showed remarkable results in terms of Voc, FF, Jsc and boosts. The striking benefit of a newly optimised hydrogenation process increased the Voc from 454 to 54 mV and the efficiency from 4.0 to 6.0% by means of a 45 min process at 450°C.
Author(s)
Lindekugel, Stefan
Lautenschlager, Harald
Ruof, T.
Reber, S.
Mainwork
The compiled state-of-the-art of PV solar technology and deployment. 23rd European Photovoltaic Solar Energy Conference, EU PVSEC 2008. Proceedings. CD-ROM  
Conference
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) 2008  
File(s)
Download (268.19 KB)
DOI
10.4229/23rdEUPVSEC2008-3AV.1.15
10.24406/publica-r-361681
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024