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2018
Conference Paper
Title

Advances in MOEMS technologies for high quality imaging systems

Abstract
An overview of advances in MOEMS devices and technologies for high quality imaging systems is provided. A particular focus is laid on recent technological further developments possibly opening gateways to unprecedented device and system functionality by e. g.: increase of pixel count towards higher parallel operation, decrease of the mirror pitch in large arrays towards applications like high-performance holography, novel technologies for higher operation bandwidth, increase of aperture size for scanning applications like LIDAR, integration of high reflection coatings for processing of multi Watt laser radiation for marking and engraving, and phased arrays for high speed laser beam steering.
Author(s)
Schenk, H.
Wagner, M.
Grahmann, J.
Merten, A.
Mainwork
Optical Microlithography XXXI  
Conference
Conference "Optical Microlithography" 2018  
Advanced Lithography Symposium 2018  
DOI
10.1117/12.2297399
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
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