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High performance 100 nm T-gate strained Si/Si0.6Ge0.4 n-MODFET
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2003
Journal Article
Title
High performance 100 nm T-gate strained Si/Si0.6Ge0.4 n-MODFET
Author(s)
Aniel, F.
Enciso-Aguilar, M.
Giguerre, L.
Crozat, P.
Adde, R.
Mack, T.
Seiler, U.
Hackbarth, T.
Herzog, H.J.
König, U.
Raynor, B.
Journal
Solid-State Electronics
DOI
10.1016/S0038-1101(02)00208-3
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF