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  4. Al Top Cathode Deposition on OLED Using DC Magnetron Sputtering
 
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2009
Journal Article
Title

Al Top Cathode Deposition on OLED Using DC Magnetron Sputtering

Abstract
We fabricated OLEDs having the evapd. Yb cathode and the sputtered Al cathode. Magnetron sputtering is a versatile deposition method, but the energetic particles during sputtering process can damage the underlying org. layers. We applied various process parameters to explain the role of Ar neutrals quoting the former researches. OLEDs showed almost comparable degrdn. under the discharge voltage of 300 V, but serious degrdns. were found at the discharge voltage of over 300 V and the low process pressure. The degrdns. influenced on the lifetime of OLED, and the measured luminance decay was much larger than the OLED having the evapd. Yb cathode due to the high leakage currents. [on SciFinder(R)]
Author(s)
Gil, T.H.
May, C.
Lakner, H.
Leo, K.
Keller, S.
Journal
Plasma Processes and Polymers  
DOI
10.1002/ppap.200932105
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
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