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  4. Design and realisation of waveguide integrated AlInAs/GaInAs HEMTs regrown by MBE for high bit rate optoelectronic receivers on InP
 
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1996
Journal Article
Title

Design and realisation of waveguide integrated AlInAs/GaInAs HEMTs regrown by MBE for high bit rate optoelectronic receivers on InP

Abstract
The successful fabrication of AlInAs/GaInAs HEMTs, regrown by MBE on patterned optical waveguide surfaces after the local removal of a previously grown photodiode layer stack, is reported. The devices are part of a distributed amplifier within an integrated optoelectronic receiver intended to operate at a 1.55 mu m wavelength and at bit rates of 20 and/or 40 Gbit/s. The performance of the HEMTs is highly comparable to reference devices grown on planar surfaces.
Author(s)
Schramm, C.
Schlaak, W.
Mekonnen, G.G.
Passenberg, W.
Umbach, A.
Seeger, A.
Wolfram, P.
Bach, H.-G.
Journal
Electronics Letters  
DOI
10.1049/el:19960730
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • aluminium compounds

  • distributed amplifiers

  • gallium arsenide

  • high electron mobility transistors

  • iii-v semiconductors

  • indium compounds

  • integrated optoelectronics

  • molecular beam epitaxial growth

  • optical receivers

  • semiconductor epitaxial layers

  • semiconductor growth

  • waveguide integrated hemts

  • mbe

  • bit rates

  • patterned optical waveguide surfaces

  • distributed amplifier

  • integrated optoelectronic receiver

  • reference devices

  • 1.55 micrometre

  • 20 Gbit/s

  • 40 Gbit/s

  • AlInAs-GaInAs

  • inp

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