English
Deutsch
Log In
Log in with Fraunhofer Smartcard
Password Login
Research Outputs
Fundings & Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Diffusion properties of ion-implanted vanadium in PECVD-SiO2 and PECVD-SiN(x)
Details
Full
Export
Statistics
Options
Show all metadata (technical view)
2003
Journal Article
Title
Diffusion properties of ion-implanted vanadium in PECVD-SiO2 and PECVD-SiN(x)
Author(s)
Isenberg, Jörg
Reber, Stefan
Warta, Wilhelm
Journal
Journal of the Electrochemical Society
DOI
10.1149/1.1575741
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE
