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Diffusion properties of ion-implanted vanadium in PECVD-SiO2 and PECVD-SiN(x)
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2003
Journal Article
Title
Diffusion properties of ion-implanted vanadium in PECVD-SiO2 and PECVD-SiN(x)
Author(s)
Isenberg, Jörg
Reber, Stefan
Warta, Wilhelm
Journal
Journal of the Electrochemical Society
DOI
10.1149/1.1575741
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE