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  4. Non-destructive imaging of organosilicate glass (OSG) thin films at low voltage with the EsB detector
 
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2016
Journal Article
Title

Non-destructive imaging of organosilicate glass (OSG) thin films at low voltage with the EsB detector

Abstract
Spatial resolution of Scanning Electron Microscopy (SEM) and electron-based material degradation of Organosilicate Glass (OSG) thin films are systematically studied using Low Voltage Scanning Electron Microscopy (LVSEM) imaging. In order to investigate the presence of shrinkage in this material, the primary beam voltage (Ep) and the working distance (WD) are optimized in combination with the use of the Energy selective Backscattered (EsB) electron detector. Results obtained with Backscattered Electron (BSE) imaging at low incident energies are discussed and compared to standard working conditions in the SEM.
Author(s)
Garitagoitia, Maria Aranzazu
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Moayedi, Elham
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Rosenkranz, Rüdiger
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Clausner, André  
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Pakbaz, Khashayar
SBA Materials, USA
Zschech, Ehrenfried
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Journal
IEEE transactions on device and materials reliability  
DOI
10.1109/TDMR.2016.2628166
Language
English
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Keyword(s)
  • imaging

  • Organosilicate Glass

  • energy selective backscattered electron detector

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