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  4. Fabrication of high speed MMICs and digital ICs using T-gate technology on pseudomorphic-HEMT structures
 
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1994
Conference Paper
Title

Fabrication of high speed MMICs and digital ICs using T-gate technology on pseudomorphic-HEMT structures

Other Title
Herstellung von Hochgeschwindigkeits-MMICs und digitalen ICs unter Verwendung der T-Gate-Technologie auf pseudomorphen HEMT-Strukturen
Abstract
A technology for pseudomorphic MODFETs with 160 nm T-gates was developed and combined with a monolithic microwave integrated circuit (MMIC) fabrication process. The realized MODFETs demonstrate transit frequencies of 145 GHz at drain currents of 260 mA and drain bias of 1.2 V. With these MODFETs we were able to fabricate 3-stage 76 GHz amplifiers with a gain of 21 dB, and 5-75 GHz broadband travelling-wave amplifiers with a gain of 9.3 dB and a noise figure less than 4.0 dB in coplanar waveguide (CPW) technology, and dynamic frequency dividers operating from 28 to 51 GHz.
Author(s)
Hülsmann, A.
Bronner, Wolfgang  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Hofmann, P.
Köhler, Klaus  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Raynor, B.
Schneider, J.
Braunstein, J.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Schlechtweg, M.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Tasker, P.J.
Thiede, A.
Jakobus, T.
Mainwork
Gallium arsenide and related compounds 1993. Proceedings  
Conference
International Symposium on Gallium Arsenide and Related Compounds 1993  
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • e-beam lithography

  • GaAs

  • millimeter wave integrated circuit

  • Millimeterwellen-Schaltkreis

  • pseudomorphe HEMTs

  • T-gate

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