Dynamics in pulsed laser deposition of ceramics

The dynamics in energy coupling, material removal, material transfer, and film growth are studied experimentally, theoretically and numerically for pulsed laser deposition of ceramics. Excimer laser radiation is investigated as a function of laser parameters (fluence, repetition rate, beam geometry) and processing variables (pressure and composition of processing gas, target-substrate arrangement) in order to deposit thin ceramic (Al2O3, ZrO2, BaTiO3, PZT) films on Si and SrTiO3 substrates including buffer layers. The laser parameters and processing variables achieve different vapor and/or plasma states represented in the type, number, momentum and energy of the ensembles of species generated, which are used to deposit thin films with defined properties in view of electronic and optical applications.