Investigation of Thin Silicone Films on Opaque Solid Surfaces Using Coherent Raman Scattering Imaging

The measurement of thin films with a thickness in the nanometer range is challenging because it requires extensive sample preparation, vacuum condition, long measurement times or using test inks that additionally contaminate the surface. The detection of those films is crucial for production processes that rely on a boundary layer to create a proper interface like adhesive bonding, coating, or lithography in various industries like automotive, solar, energy storage and semiconductor manufacturing. Consequently, there is a need for quick, reliable measurement techniques with high sensitivity to ensure the technical cleanliness of the opaque surface. In this paper the feasibility of epi-detection with coherent Raman scattering (CRS) Imaging is investigated on different substrate materials and demonstrated to be a method for fast scanning of large nontransparent surfaces including chemical fingerprinting of the substances atop. Therefore, various samples with low surface energy filmic contaminations from polysiloxanes are produced and investigated with CRS Imaging, a technique mostly applied to biological samples with the novel use demonstrated here for surface contamination monitoring in material sciences.