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  4. Influence of MOVPE growth conditions and substrate parameters on the structural quality of multi-period InGaAsP/InP MQW structures
 
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1996
Conference Paper
Title

Influence of MOVPE growth conditions and substrate parameters on the structural quality of multi-period InGaAsP/InP MQW structures

Abstract
In this work we have investigated the MOVPE growth of multi-period InGaAsP/InP quantum confined Stark effect (QCSE) layer structures and provide evidence that the QCSE response can be influenced by optimizing the gas exchange procedure, mainly to minimize carry-over effects. Secondly, we present new results on the thermal stability behaviour of these MQW structures which appear to be strongly related with the underlying buffer layer and substrate material.
Author(s)
Reier, F.W.
Bornholdt, C.
Hoffmann, D.
Kappe, F.
Mörl, L.
Mainwork
IPRM '96. Eigth International Conference on Indium Phosphide and Related Materials. Proceedings  
Conference
International Conference on Indium Phosphide and Related Materials (IPRM) 1996  
DOI
10.1109/ICIPRM.1996.492268
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • gallium arsenide

  • iii-v semiconductors

  • indium compounds

  • optical waveguides

  • quantum confined stark effect

  • semiconductor growth

  • semiconductor quantum wells

  • substrates

  • thermal stability

  • vapour phase epitaxial growth

  • movpe growth conditions

  • substrate parameters

  • structural quality

  • multi-period InGaAsP/InP mqw structures

  • gas exchange procedure

  • carry-over effects

  • mqw structures

  • buffer layer

  • InGaAsP-InP

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