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  4. Ultra flat P-N junctions formed by solid source laser doping
 
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1990
Conference Paper
Title

Ultra flat P-N junctions formed by solid source laser doping

Abstract
A CO2 high-power laser was used for laser-driven boron and phosphorus diffusion from silicate glass layers. Flat profiles were obtained in a depth less than 0.1 mym by a concentration of about 10 high 19 ccm. For analytics mainly were used SIMS, SEM and spreading resistance method.
Author(s)
Stock, G.
Bollmann, D.
Buchner, R.
Neumayer, G.
Haberger, K.
Mainwork
E-MRS Spring Meeting 1990. Proceedings  
Conference
European Materials Research Society (Spring Meeting) 1990  
Language
English
IFT  
Keyword(s)
  • diffusion

  • doping

  • Dotierung

  • flach

  • flat

  • Halbleiter

  • laser

  • Oberfläche

  • p-n junction

  • p-n Übergang

  • pn-junction

  • pn-Übergang

  • semiconductor

  • shallow

  • silicate glass

  • silicon

  • Silizium

  • surface

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