Repair of clear X-ray mask defects by laser-induced metal deposition
Abstract
The repair of clear defects on X-ray masks requires the deposition of well-loclized high quality films with high aspect ratios. Laser-induced material deposition of heavy metals is one of the alternatives to meet these requirements. Experiments were performed to decide if pyrolytic or photolytic deposition is more favourable for X-ray mask repair. Deposits of various materials (especially of W, Au, And Sn) on Si membranes were investigated with respect to their X-ray opacity. (IMT)
