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  4. ArF laser induced lift-off process
 
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1986
Journal Article
Title

ArF laser induced lift-off process

Abstract
A method is described which employs an excimer laser pulse to structure metal and SiO2 layers on Si, SiO, InP and LiNbO3 surfaces. The parameters determining the quality of this process are discussed.
Author(s)
Moerl, L.
Journal
Microelectronic engineering  
Conference
International Conference on Microlithography, Microcircuit Engineering 1986  
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • argon compounds

  • excimer lasers

  • integrated circuit technology

  • laser beam applications

  • surface treatment

  • VLSI

  • process parameters

  • submicron lithography

  • arf laser induced lift-off process

  • excimer laser pulse

  • arf excimer laser

  • Si

  • SiO

  • InP

  • SiO2

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