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  4. ArF laser induced lift-off process
 
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1986
Journal Article
Titel

ArF laser induced lift-off process

Abstract
A method is described which employs an excimer laser pulse to structure metal and SiO2 layers on Si, SiO, InP and LiNbO3 surfaces. The parameters determining the quality of this process are discussed.
Author(s)
Moerl, L.
Zeitschrift
Microelectronic engineering
Konferenz
International Conference on Microlithography, Microcircuit Engineering 1986
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Language
English
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Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI
Tags
  • argon compounds

  • excimer lasers

  • integrated circuit te...

  • laser beam applicatio...

  • surface treatment

  • VLSI

  • process parameters

  • submicron lithography...

  • arf laser induced lif...

  • excimer laser pulse

  • arf excimer laser

  • Si

  • SiO

  • InP

  • SiO2

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