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  4. Development of rugged 2 GHz power bars delivering more than 100 W and 60% power added efficiency
 
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2010
Journal Article
Title

Development of rugged 2 GHz power bars delivering more than 100 W and 60% power added efficiency

Abstract
In this work we systematically study the structural, optical and electrical properties of AlGaN/GaN heterostructures grown by MOCVD 3-inch on SiC substrates Thefinally developed HEMTs demonstrate excellent highvoltage stability, high power performance and large power added efficiencies. For a drain bias of 100 V an output-power-density around 26 W/mm with 25 dB linear gain is obtained. On 36 mm gate width devices an output power beyond 100 W is achieved with a power added efficiency above 60% and a linear gain around 17 dB. Ruggedness on these large devices is proven by successfully passing harsh intentional device mismatch tests during operation at 50 V. Reliability is tested at a drain bias of 50 V. Under DC conditions a drain-current degradation below 20% after 20 years is extrapolated. Under RF stress the observed change in output power is well below 0.1 dB after a test duration of more than 500h.
Author(s)
Waltereit, Patrick  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Bronner, Wolfgang  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Quay, Rüdiger  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Dammann, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Müller, Stefan
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mikulla, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Ambacher, Oliver  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Harm, L.
Lorenzini, M.
Rödle, T.
Riepe, K.
Bellmann, K.
Buchheim, C.
Goldhahn, R.
Journal
Physica status solidi. C  
Conference
International Symposium on Compound Semiconductors (ISCS) 2009  
DOI
10.1002/pssc.200983853
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • AlGaN/GaN

  • MOCVD

  • performance

  • reliability

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