Recent contributions to the development of non-optical lithography

Lithography of quarter micron devices is definitely in the domain of optical lithography, however, for the 0.18 mu m 1 Gbit devices the lithography tools have not been decided yet. There is the possibility of i-line and DUV steppers, e-beam direct write, X-ray lithography and ion projection lithography. This paper will describe recent activities of the Fraunhofer ISiT in the field of e-beam direct write, X-ray and ion projection lithography.