• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Optical beam induced currents in MOS transistors
 
  • Details
  • Full
Options
1990
Journal Article
Title

Optical beam induced currents in MOS transistors

Abstract
The effect of the optical beam induced current (OBIC effect) is discussed considering a MOS structure. Compared with the simpler case of a pn junction the MOS transistor shows a complex behaviour leading to various results on the output current. It can be shown that this depends strongly on the device parameters, the spot position and the outer circuit voltage supply. A device analysis techniques resulting from these aspects is dicussed which allows to observe the digital logic states of the circuit under test. It thus serves as a contactless test technique inside the IC.
Author(s)
Fritz, J.
Lackmann, R.
Journal
Microelectronic engineering  
Conference
European Conference on Electron and Optical Beam Testing of Integrated Circuits 1989  
DOI
10.1016/0167-9317(90)90051-T
Language
English
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Keyword(s)
  • Fotostrom

  • kontaktloser Schaltungstest

  • OBIC

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024