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  4. Epitaxial N-type silicon solar cells with 20% efficiency
 
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2016
Conference Paper
Title

Epitaxial N-type silicon solar cells with 20% efficiency

Abstract
Silicon wafers have still a significant contribution to the total cost of production for silicon solar cells. One cost driver when using classical wafering techniques is kerf loss. With the approach using porous silicon as a detachment layer and as a seed layer for epitaxy kerf losses can be avoided. In this work, solar cells with epitaxially grown n-type wafers are presented. The best EpiWafer-cell reaches an open circuit voltage of 657.5mV, a short circuit current of 39.6mA/cm2and a fill factor of 77%. The resulting energy conversion efficiency of 20% proves the high quality of this material.
Author(s)
Milenkovic, N.
Drießen, Marion  
Steinhauser, Bernd  
Lindekugel, Stefan
Benick, Jan  
Hermle, Martin  
Janz, Stefan  
Reber, S.
Mainwork
IEEE 43rd Photovoltaic Specialists Conference, PVSC 2016  
Conference
Photovoltaic Specialists Conference (PVSC) 2016  
DOI
10.1109/PVSC.2016.7749408
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • Materialien - Solarzellen und Technologie

  • Photovoltaik

  • Silicium-Photovoltaik

  • Epitaxie

  • Si-Folien und SiC-Abscheidungen

  • EpiWafer

  • high efficiency

  • n-type

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