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  4. Sub-100 nm nanostructuring of silicon by ultrashort laser pulses
 
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2005
Journal Article
Title

Sub-100 nm nanostructuring of silicon by ultrashort laser pulses

Abstract
Techniques based on laser scanning microscopes for nanoprocessing of periodic structures on silicon with ultra-short laser pulses have been developed. Ripples of 800 - 900 nm spacing were obtained after laser irradiation at a wavelength of 1040 nm, a repetition rate of 10 kHz and a fluence of 2 J/cm2 in air. Smaller features of 70 - 100nm spacing were achieved in oil at a wavelength of 800 nm, a repetition rate of 90 MHz and a fluence of 200 - 300 mJ/cm2 by using a high numerical focusing objective.
Author(s)
Harzic, R. le
Schuck, H.  
Sauer, D.
Anhut, T.
Riemann, I.  
König, K.
Journal
Optics Express  
Open Access
DOI
10.1364/OPEX.13.006651
Additional link
Full text
Language
English
Fraunhofer-Institut für Biomedizinische Technik IBMT  
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