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1995
Journal Article
Title

The STORM technology CAD system

Abstract
This paper gives an outline of the STORM TCAD system. STORM is a program system for the two-dimensional simulation of semiconductor fabrication process sequences and the optimization of the electrical behaviour of the devices fabricated. It has been developed within an ESPRIT project by a consortium of European companies and research institutes. In this presentation, the software structure of STORM is described, followed by a discussion of the physical models developed. Finally, some application examples are given.
Author(s)
Lorenz, J.  
Hill, C.
Jaouen, H.
Lombardi, C.
Lyden, C.
Meyer, K. de
Pelka, J.
Poncet, A.
Rudan, M.
Solmi, S.
Journal
Microelectronics journal  
DOI
10.1016/0026-2692(95)98917-G
Language
English
IIS-B  
Keyword(s)
  • CAD/CAM

  • digital simulation

  • semiconductor process modelling

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