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Application of novolack resist systems in x-ray mask fabrication
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1983
Conference Paper
Title
Application of novolack resist systems in x-ray mask fabrication
Author(s)
Pongratz, S.
Betz, H.
Heuberger, A.
Mainwork
Proceedings of the KODAK Microelectronics Seminar Interface '83
Conference
KODAK Microelectronics Seminar Interface
Language
English
IFT
Keyword(s)
Lithographie
Photolack
Röntgenstrahlen