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  4. Plasmatron sputtering for the production of high stability NiCr resistive films
 
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1984
Journal Article
Title

Plasmatron sputtering for the production of high stability NiCr resistive films

Author(s)
Schiller, S.
Heisig, U.
Goedicke, K.
Bilz, H.
Henneberger, J.
Brode, W.
Dietrich, W.
Journal
Thin solid films  
DOI
10.1016/0040-6090(84)90536-4
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP  
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