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Plasmatron sputtering for the production of high stability NiCr resistive films
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1984
Journal Article
Title
Plasmatron sputtering for the production of high stability NiCr resistive films
Author(s)
Schiller, S.
Heisig, U.
Goedicke, K.
Bilz, H.
Henneberger, J.
Brode, W.
Dietrich, W.
Journal
Thin solid films
DOI
10.1016/0040-6090(84)90536-4
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP