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1994
Conference Paper
Title
Multi-level Fresnel zone lenses capable of being fabricated with only one binary mask
Abstract
Multi-level approximated Fresnel zone lenses with reduced level numbers in the outer zones are investigated and compared with Fresnel zone lenses of unique level numbers over the whole lens, Calculations of the fabrication error effects on diffraction efficiency for both lens types are performed. Measurements of focusing efficiency show that, especially for Gaussian beam illumination, segmented Fresnel zone lenses can reach nearly as high focusing efficiencies as normal Fresnel zone lenses. Arrays of segmented lenses can be fabricated using only one binary Fresnel zone lens mask with the aid of a modified optical stepper with fixed scaling down factors in the ratio of 1:1/ square root 2 from one to the next step of pattern transfer in the lithographic process. The fabrication of such lenses could be advantageous because the generation of precise e-beam written masks with a large number of binary ring zones is time consuming and expensive.
Language
English
Keyword(s)
electron beam lithography
errors
lenses
optical design techniques
optical fabrication
optical focusing
binary mask
fresnel zone lenses
reduced level numbers
outer zones
whole lens
fabrication error
diffraction efficiency
focusing efficiency
gaussian beam illumination
binary fresnel zone lens mask
modified optical stepper
scaling down factors
pattern transfer
lithographic process
e-beam written masks
binary ring zones