High-precision nm-multilayers for EUV and x-ray optical application

In this paper we will give an overview of the preparation, characterization and typical results of nm-multilayer coatings prepared by pulsed laser depostion (PLD) and magnetron sputter depostion (MSD). We have achieved particulary outstanding results for the Ni/C and Mo/Si materials systems, e.g. extreme ultraviolet (EUV) reflectances of >71% with Mo/Si. The thickness deviations of the multilayer period on flat and curved substrates with macroscopic dimensions (150mm diameter) are reduced down to <0.05%. The standard deviation of the thickness from run-to-tun is <0.2%.