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  4. Microelectromechanical magnetic field sensor based on DE effect
 
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2014
Journal Article
Title

Microelectromechanical magnetic field sensor based on DE effect

Abstract
We present a fully integrated microelectromechanical magnetic field sensor based on the DE effect. The vacuum encapsulated sensor extends our previous approach [B. Gojdka et al., Appl. Phys. Lett. 99, 223502 (2011); Nature 480, 155 (2011)] and now involves an intermediate piezoelectric AlN layer between a SiO2 cantilever and a magnetostrictive FeCoBSi top layer. The AlN layer serves two functions: It drives the resonator, and it is used for electrical read out. The limit of detection was strongly enhanced to 12 nT/SRHz at 10 Hz.
Author(s)
Jahns, R.
Zabel, S.
Marauska, S.
Gojdka, B.
Wagner, B.
Knöchel, R.
Adelung, R.
Faupel, F.
Journal
Applied Physics Letters  
DOI
10.1063/1.4891540
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
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