• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Photoluminescence from the quasi-two-dimensional electron gas at a single silicon delta-doped layer in GaAs
 
  • Details
  • Full
Options
1990
Journal Article
Title

Photoluminescence from the quasi-two-dimensional electron gas at a single silicon delta-doped layer in GaAs

Other Title
Photolumineszenz von dem quasi-2-dimensionalen Elektronengas in einer Silizium-dotierten Schicht in GaAs
Abstract
Radiative recombination of quasi-two-dimensional electrons with photocreated holes is reported in single silicon delta-doped layers in GaAs. These holes are confined within is repulsive for holes. Replacing the GaAs surface by an Al0.33Ga0.67As/GaAs heterointerface the photoluminescence from the delta-doping spike is drastically enhanced. It is shown by photoluminescence and Raman spectroscopy that density of carriers created by cw photoexcitation can be made sufficiently high in the heterostructure to modify actual shape of the doping-induced potential well.
Author(s)
Ploog, K.
Fischer, A.
Wagner, J.
Journal
Physical Review. B  
DOI
10.1103/PhysRevB.42.7280
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • 2-dimensional electron gas

  • delta-doping

  • Delta-Dotierung

  • GaAs

  • photoluminescence

  • zweidimensionales Elektronengas

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024