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2003
Conference Paper
Title
System for angle-resolved and total light scattering, transmittance, and reflectance measurements of optical components at 157 nm and 193 nm
Abstract
A system is presented that measures total and angle resolved light scattering, reflectance and transmittance at 193 nm and 157 nm. Substrates and coatings for VUV lithography components can be investigated with high sensitivity, down to scattering levels of 1ppm.