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  4. Integration of (Poly-Si/Air)n Distributed Bragg Reflectors in a 150 mm Bulk Micromachined Wafer-Level MOEMS Fabrication Process
 
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2024
Journal Article
Title

Integration of (Poly-Si/Air)n Distributed Bragg Reflectors in a 150 mm Bulk Micromachined Wafer-Level MOEMS Fabrication Process

Abstract
This paper reports the development and integration of (Poly-Si/Air)n Distributed BRAGG Reflectors (DBR) in a MOEMS Fabry-Pérot-Interferometer (FPI) concept. The realized reflectors constitute a promising and resource-efficient alternative to complex Ion-Assisted Deposition based DBRs while maintaining their advantages. Compared to state of the art MOEMS FPIs the (Poly-Si/Air)n DBRs can be integrated into two moveable reflector carriers based on two individually fabricated wafers which are bonded. The (Poly-Si/Air)n DBRs are investigated as (HL) and (HL)2 reflector stacks showing a reflectance above 91% within the wavelength range of 2.8-5.7 μm.
Author(s)
Helke, Christian
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Seiler, Jan
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Meinig, Marco  
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Großmann, Toni
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Bonitz, Jens  
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Haase, Micha
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Zimmermann, Sven
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Ebermann, M.
Kurth, S.
Reuter, Danny  
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Hiller, Karla  
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Journal
IEEJ transactions on electrical and electronic engineering  
Open Access
DOI
10.1002/tee.23960
Additional link
Full text
Language
English
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Keyword(s)
  • etalon

  • Fabry-Pérot interferometer

  • micro spectrometer

  • Poly-Si

  • reflector

  • tunable filter

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