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The influence of pulsed magnetron sputtering on topography and crystallinity of TiO2 films on glass
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2000
Journal Article
Title
The influence of pulsed magnetron sputtering on topography and crystallinity of TiO2 films on glass
Author(s)
Treichel, O.
Kirchhoff, V.
Journal
Surface and coatings technology
DOI
10.1016/S0257-8972(99)00522-8
Language
English
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
