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2006
Journal Article
Title

Ion sources for vacuum thin film technology

Abstract
Ion sources are used in vacuum thin film technology in various types and for numerous applications. This article provides an overview of basic features of ion sources and of the present status of ion source technology. This includes an explanation of the main parameters of such sources, typical set-up and applications, as well as power supply components.
Author(s)
Reuschling, R.
BOC Edwards UK
Schultheiß, E.
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Journal
Vakuum in Forschung und Praxis  
DOI
10.1002/vipr.200690031
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP  
Keyword(s)
  • vacuum

  • Vakuum

  • Dünnschichttechnik

  • thin film

  • Ionenquelle

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