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  4. Multi-wafer MBE grown InP-based DHBTs for millimeterwave and digital applications
 
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2006
Journal Article
Title

Multi-wafer MBE grown InP-based DHBTs for millimeterwave and digital applications

Other Title
Multi-wafer MBE gewachsenen InP-DHBTs für Millimeterwellen- und digitale Anwendungen
Abstract
In this paper, we report the development and performance of a complete InP-based DHBT manufacturable technology from materials growth to device and integrated circuits realizations. The InGaAs/InP DHBTs were grown in a multi-wafer solid phosphorus MBE system. High frequency devices with an effective emitter area of 4.8 µm2 exhibited peak f(ind T) and f(ind MAX) values of 250 and 270 GHz, respectively, at a collector current density of about 4 mA/µm2. Using this technology, distributed amplifiers and low power consumption selectors, have been successfully fabricated and tested above 80 Gbit/s.
Author(s)
Driad, Rachid  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Lösch, R.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Schneider, K.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Makon, R.E.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Ludwig, M.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Weimann, G.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Journal
Physica status solidi. C  
DOI
10.1002/pssc.200564102
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • III-V semiconductor

  • molecular beam epitaxy

  • microwave integrated electronic

  • semiconductor device

  • bipolar transistor

  • microelectronic

  • III-V Halbleiter

  • molekulare Strahlepitaxie

  • integrierte Mikrowellenschaltung

  • Bipolartransistor

  • Mikroelektron

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