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2001
Conference Paper
Title
Calibrated reference standards for films in the nanometer range
Abstract
The paper refers to the development, manufacture and metrological evaluation of artifacts for the thickness of an ultra-thin film deposited on a substrate. The artifacts shall be applicable as metrological reference standards for the calibration of film thickness measurement systems like X-ray reflectometers or ellipsometers. This calibration shall contribute to consistent traceable measurement results.