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Advanced resist processing for thick photoresist applications
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1996
Journal Article
Title
Advanced resist processing for thick photoresist applications
Author(s)
Cullmann, E.
Löchel, B.
Maciossek, A.
Rothe, M.
Journal
Microelectronic engineering
DOI
10.1016/0167-9317(95)00307-X
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
