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2002
Conference Paper
Title

New microwave plasma sources for large scale applications up to atmospheric pressure

Title Supplement
Abstract
Abstract
Plasma technology is used in a wide field of applications for example for PECD-deposition, activation and etching. In particular microwave enhanced plasmas are very effective for activation of surfaces. Our objective targets are to construct plasma sources for large area application and plasma sources which can be used in a wide pressure regime as possible up to atmospheric pressure. In this presentation two sources for large area and wide pressure range plasma are discussed. They are based on a coaxial coupling of the magnetron and the antenna.
Author(s)
Emmerich, R.
Kaiser, M.
Urban, H.
Graf, M.
Räuchle, E.
Elsner, P.
Feichtinger, J.
Schulz, A.
Walker, M.
Baumgärtner, K.-M.
Muegge, H.
Mainwork
ICOPS 2002, 29th IEEE International Conference on Plasma Science. Conference record. Abstracts  
Conference
International Conference on Plasma Science (ICOPS) 2002  
DOI
10.1109/PLASMA.2002.1030649
Language
English
Fraunhofer-Institut für Chemische Technologie ICT  
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