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  4. Deposition of Al and Cu nanoparticles on silicon wafer using a picosecond Nd: YAG Laser. An experiment-based parameter optimization guide
 
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2017
Conference Paper
Title

Deposition of Al and Cu nanoparticles on silicon wafer using a picosecond Nd: YAG Laser. An experiment-based parameter optimization guide

Abstract
The optimization of parameters for laser deposition of nanoparticles on Si-wafer is studied. The threshold of laser energy, pulses per laser shot and overlapping is crucial in order to achieve the best deposition results.
Author(s)
Azhdast, M.H.
Kossatz, M.
Eichler, H.J.
Lang, K.-D.
Glaw, V.
Mainwork
CLEO: Applications and Technology  
Conference
Conference on Lasers and Electro-Optics - Applications and Technology (CLEO A&T) 2017  
DOI
10.1364/CLEO_AT.2017.JTu5A.12
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
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