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  4. Optimization of the dielectric layer for electrowetting on dielectric
 
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2019
Journal Article
Title

Optimization of the dielectric layer for electrowetting on dielectric

Abstract
In this work the minimum actuation voltage Vmin for droplet actuation with electrowetting on dielectric (EWOD) is analyzed. At first, the theoretical background of drop transport with EWOD is shown. Then the impact of thin dielectric films deposited with atomic layer deposition (ALD) and super-hydrophobic layers on the minimum required actuation voltage for drop transport are presented. To this, contact angles are measured on both Al2O3 and fluorinated DLC each with a drop of water. For verify the hypothesis, the analytically calculated values for the minimum actuation voltage Vmin are compared with numerical simulation results using COMSOL Multiphysics®. The results show that the actuation voltage value from the simulation is lower than calculated analytically.
Author(s)
Türk, Semih
Uni DuE / EBS
Schug, Alexander
Uni DuE / EBS
Viga, Reinhard
Uni DuE / EBS
Jupe, Andreas
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Vogt, Holger
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Journal
Integration: The VLSI journal  
Project(s)
EWALD
Funder
Deutsche Forschungsgemeinschaft DFG  
Open Access
DOI
10.24406/publica-r-257372
10.1016/j.vlsi.2019.03.004
File(s)
N-541114.pdf (15.18 MB)
Language
English
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Keyword(s)
  • electrowetting-on-dielectric (EWOD)

  • minimum actuation voltage

  • atomic layer deposition (ALD)

  • microstructured surface

  • wetting behaviour

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