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  4. Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write
 
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2015
Poster
Title

Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write

Title Supplement
Poster presented at Workshop on µ-contact-printing and nanoimprint technology 2015; Dresden, Germany, 9th March 2015
Author(s)
Thrun, Xaver
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Choi, Kang-Hoon
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Gutsch, Manuela
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Hohle, Christoph  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Rudolph, Matthias  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Seidel, Konrad  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Conference
Workshop on µ-contact-printing and nanoimprint technology 2015  
File(s)
Download (901.1 KB)
Rights
Under Copyright
DOI
10.24406/publica-fhg-389257
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
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