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A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography
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2008
Conference Paper
Title
A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography
Author(s)
Schnattinger, T.
Erdmann, A.
Mainwork
Advances in resist materials and processing technology XXV
Conference
Conference "Advances in Resist Materials and Processing Technology" 2008
DOI
10.1117/12.772507
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
