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  4. Ultrafast pulsed laser deposition of chalcogenide glass films for low-loss optical waveguides
 
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2003
Conference Paper
Title

Ultrafast pulsed laser deposition of chalcogenide glass films for low-loss optical waveguides

Abstract
Ultra-fast pulsed laser deposition using high-repetition-rate short-pulse lasers has been shown to provide high optical quality, super smooth thin films free of scattering centres. The optimized process conditions require short ps or sub-ps pulses with repetition rate in the range 1-100 MHz, depending on the target material. Ultra-fast pulsed laser deposition was used to successfully deposit atomicaliy-smooth, Smicron thick As2S3 films. The as-deposited films were photosensitive at wavelengths close to the band edge (520 nm) and waveguides could be directly patterned into them by photo-darkening using an Argon ion or frequency doubled Nd:YAG laser. The linear and nonlinear optical properties of the films were measured as well as the photosensitivity of the material. The optical losses in photo-darkened waveguides were <0.2 dB/cm at wavelengths beyond 1200nm and <0.1 dB/cm in as-deposited films. The third order nonlinearity, n2,As2S3, was measured using both four-w ave mixing and the z-scan technique and varied with wavelength from 100 to 200 times fused silica (n2,Silica 3×10-16 cm2/W) between 1100nm and 1100nm with low nonlinear absorption. Encouraged by the Ultrafast laser deposition results, we have built a new specialized mode-locked picosecond laser system for deposition of optical films and for laser formation of nanoclusters. The newly developed "state of the art" powerful Nd:YVO laser can operate over a wide range of wavelengths, intensities, and repetition rates in MHz range. A brief description of the 50W laser installation is presented.
Author(s)
Luther-Davies, B.
Kolev, V.Z.
Lederer, M.J.
Yinlan, R.
Samoc, M.
Jarvis, R.A.
Rode, A.V.
Giesekus, J.
Du, K.-M.
Duering, M.
Mainwork
Advanced optical processing of materials  
Conference
Symposium Y "Advanced Optical Processing of Materials" 2003  
Materials Research Society (Spring Meeting) 2003  
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
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