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Plasma CVD of high quality titanium nitride using titanium (IV) isopropoxide as precursor
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1997
Journal Article
Title
Plasma CVD of high quality titanium nitride using titanium (IV) isopropoxide as precursor
Author(s)
Weber, A.
Pöckelmann, R.
Klages, C.-P.
Journal
Microelectronic engineering
DOI
10.1016/S0167-9317(96)00055-X
Language
English
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST