HIPIMS ITO films from a rotating cylindrical cathode

High Power Impulse Magnetron Sputtering (HIPIMS) allows the deposition of thin films from plasmas with high metallic ion content. HIPIMS has been successfully used to deposit indium tin oxide (ITO) films from planar ceramic targets, for several applications including ice-free windows and shaped glass tubes. These films present good conductivity as well as good wear resistance, derived from a nanocrystalline structure. Nevertheless, industry demands more cost efficient processes. In view of that, the use of rotatable cylindrical cathodes is a promising alternative due to their many advantages: better material utilization, longer durability, reduced arcing and more. In this work, ITO films were produced from a rotating cylindrical cathode by HIPIMS and DC magnetron sputtering. The influence of process parameters (average power, voltage, peak current and pressure) on resulting film properties was investigated. The depositions were performed at room temperature and then followed by annealing. Electrical and optical properties were analyzed and process stability was investigated. Highly transparent films were obtained with resistivity between 300-400 mOcm.