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  4. Evaluation of resistless Ga+ beam lithography for UV-NIL stamp fabrication
 
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2012
Poster
Title

Evaluation of resistless Ga+ beam lithography for UV-NIL stamp fabrication

Title Supplement
Poster at 11th International Conference on Nanoimprint & Nanoprint Technology, October 24-26, 2012, Silverado Resort, Napa, California
Author(s)
Rumler, Maximilian
Fader, Robert
Haas, Anke  
Rommel, Mathias  orcid-logo
Bauer, A.J.
Frey, Lothar
Conference
International Conference on Nanoimprint & Nanoprint Technology (NNT) 2012  
File(s)
Download (490.77 KB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-377600
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • nanoimprint

  • UV-NIL

  • Gallium

  • implantation

  • reactive ion ecthing

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